Blackwell · Nvidia · Google · New York · Datacenter Dynamics
Oxford Instruments installs PlasmaPro ASP ALD system at NYU Nanofab
Compiled by KHAO Editorial — aggregated from 1 source. See llms.txt for citation guidance.
◌ Single Source
Oxford Instruments has partnered with the NYU Nanofabrication Cleanroom to install a PlasmaPro ASP atomic layer deposition (ALD) system at the facility, the first in the US to be used for superconducting quantum applications.
Key facts
- In June 2025, the company sold its business unit responsible for making dilution fridges for supercooled quantum computers to Quantum Design for £60 million ($81m)
- The acquisition was funded by the US Microelectronics Commons through the NORDTECH hub, with the system directly supporting the Lab-to-Fab initiative to strengthen microelectronics research
- Oxford Instruments was founded in 1959 as the first commercial spin-out from Oxford University
- Developed by Oxford Instruments and first launched in 2023, the PlasmaPro ASP ALD system was designed to produce superconducting nitrides essential for quantum applications, with the company saying
Summary
Developed by Oxford Instruments and first launched in 2023, the PlasmaPro ASP ALD system was designed to produce superconducting nitrides essential for quantum applications, with the company saying it offers deposition rates three times faster than alternatives. Atomic Layer Deposition is an advanced deposition technique that allows for ultra-thin films of a few nanometers to be deposited in a precisely controlled way, with the usage of plasma allowing for improved film properties and a wide range of possible materials. The acquisition was funded by the US Microelectronics Commons through the NORDTECH hub, with the system directly supporting the Lab-to-Fab initiative to strengthen microelectronics research prototyping and workforce development, launched in 2022 under the US CHIPS and Science Act.